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Pulsed Laser Deposition System

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Pulsed Laser Deposition System

Product Details:

Place of Origin:China
Description

Main parameter index:
1.: the ultimate vacuum coating chamber is ≤6.6X10-5Pa; the pumping time: 30 minutes is better than 8X10-4Pa
2. target: 4 feet rotation target (with shield), revolution, rotation and scanning, target substrate distance adjustable (30-90mm)
3. substrate rotation: revolution, rotation of two samples of toga shield
4. substrate heating temperature: the use of armored heating plate,0-800℃ continuous adjustable; using temperature control instrument for automatic temperature measurement and control of PID, temperature control accuracy ±1℃
5. 2 way MFC mass flowmeter (range: 0-100sccm) controls the flow of gas
6. control system: touch screen +PLC control

Contact Details
Advanced Material Technologies(KIN GROUP) Co.,Ltd

Contact Person: Mr. Lin Yue

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